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Angle‐Tolerant Circular Eigenpolarizations Enabled by Orientational Disorder in Dielectric Metasurfaces

Tanaka, Katsuya ; Rahimzadegan, Aso ORCID iD icon 1; Arslan, Dennis; Fitriana, Anna; Fasold, Stefan; Pidgayko, Dmitry; Steinert, Michael; Pertsch, Thomas; Decker, Manuel; Rockstuhl, Carsten ORCID iD icon 1,2; Staude, Isabelle
1 Institut für Theoretische Festkörperphysik (TFP), Karlsruher Institut für Technologie (KIT)
2 Institut für Nanotechnologie (INT), Karlsruher Institut für Technologie (KIT)

Abstract:

Tailored structural disorder in photonic metasurfaces enables advanced light shaping. Specifically, an orientational disorder in chiral nanostructures leads to circular eigenpolarizations with a heavily suppressed linear birefringence. The orientational disorder is, therefore, vital to observing purely chiroptical effects such as circular dichroism and optical activity. Here, it is
experimentally and numerically demonstrated that all-dielectric orientationally disordered chiral bilayer square array metasurfaces preserve highly circular eigenpolarizations for a wide range of incidence angles. The angle-dependent
performance of disordered chiral metasurfaces is compared with that of their C$_2$ and C$_4$ symmetric periodic counterparts, demonstrating that the disordered structures provide nearly pure circular eigenpolarizations across a
larger range of angles and wavelengths, whereas the periodic ones do not. These findings underscore the ability of tailored disorder to enhance the robustness of engineered chiroptical responses of all-dielectric metasurfaces and highlight its potential for flat, integrable, and highly efficient optical components, such as circular polarizers and beam splitters.


Verlagsausgabe §
DOI: 10.5445/IR/1000178762
Veröffentlicht am 06.02.2025
Cover der Publikation
Zugehörige Institution(en) am KIT Institut für Nanotechnologie (INT)
Institut für Theoretische Festkörperphysik (TFP)
Publikationstyp Zeitschriftenaufsatz
Publikationsmonat/-jahr 04.2025
Sprache Englisch
Identifikator ISSN: 2195-1071
KITopen-ID: 1000178762
HGF-Programm 43.32.02 (POF IV, LK 01) Designed Optical Materials
Erschienen in Advanced Optical Materials
Verlag John Wiley and Sons
Band 13
Heft 10
Vorab online veröffentlicht am 28.01.2025
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