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Interlayer Spacing Control of $MoS_2$ with Covalent Thiol Functionalization: Understanding Structure and Electrochemistry from Experiments and Simulation

Choi, Jaehoon 1; Nam, Kyeonghyeon; Malik, Yoga T. 1; Leiter, Robert ORCID iD icon 1; Zarrabeitia, Maider ORCID iD icon 1; Scheurer, Christoph; Fleischmann, Simon ORCID iD icon 1
1 Helmholtz-Institut Ulm (HIU), Karlsruher Institut für Technologie (KIT)

Abstract:

Molybdenum disulfide (MoS2) is an increasingly investigated two-dimensional electrode material for electrochemical energy storage and conversion. Strategies to increase its interlayer spacing are emerging and have been shown to improve ion intercalation capacity and kinetics. This work explores covalent thiol functionalization for controlling MoS2 interlayer spacing. Using a hydrothermal bottom-up synthesis, dithiolated molecules can be directly incorporated into the MoS2 lattice to act as pillars. Using a comprehensive combination of experiments and simulation, we investigate the influence of dithiol pillar loading on the emerging structure, pillar–host interactions, and electrochemistry. Our results reveal clustering of pillars at low loading, leading to an inhomogeneous interlayer expansion. At high pillar loading, the formation of defective bonding configurations with excess sulfur is observed. Interlayer expansion leads to an increased electrochemical Li+ storage capacity with a maximum of 1.43 Li+ per MoS2. However, dithiols occupy storage sites and impede Li+ transport within the interlayer space, leading to unfavorable performance at high pillar loading. ... mehr


Verlagsausgabe §
DOI: 10.5445/IR/1000185370
Veröffentlicht am 06.10.2025
Cover der Publikation
Zugehörige Institution(en) am KIT Helmholtz-Institut Ulm (HIU)
Publikationstyp Zeitschriftenaufsatz
Publikationsdatum 14.10.2025
Sprache Englisch
Identifikator ISSN: 1936-0851, 1936-086X
KITopen-ID: 1000185370
HGF-Programm 38.02.01 (POF IV, LK 01) Fundamentals and Materials
Erschienen in ACS Nano
Verlag American Chemical Society (ACS)
Band 19
Heft 40
Seiten 35425–35437
Vorab online veröffentlicht am 02.10.2025
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