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Heterogeneously integrated lithium tantalate-on-silicon nitride modulators for high-speed communications

Cai, Jiachen; Kotz, Alexander ORCID iD icon 1; Larocque, Hugo; Wang, Chengli; Ji, Xinru; Zhang, Junyin; Drayss, Daniel ORCID iD icon 1; Sun, Jiale; Zheng, Shuhang; Ou, Xin ; Koos, Christian 1; Kippenberg, Tobias J.
1 Institut für Photonik und Quantenelektronik (IPQ), Karlsruher Institut für Technologie (KIT)

Abstract:

Driven by the prospects of higher bandwidths for optical interconnects, integrated modulators involving materials beyond those available in silicon manufacturing increasingly rely on the Pockels effect. For instance, wafer-scale bonding of lithium niobate films onto ultralow loss silicon nitride photonic integrated circuits provides heterogeneous integrated devices with low modulation voltages operating at higher speeds than silicon photonics. However, in spite of its excellent electro-optic modulation capabilities, lithium niobate suffers from drawbacks such as birefringence and long-term bias instability. Among other available electro-optic materials, lithium tantalate can overcome these shortcomings with its comparable electro-optic coefficient, significantly improved photostability, low birefringence, higher optical damage threshold, and enhanced DC bias stability. Here, we demonstrate wafer-scale heterogeneous integration of lithium tantalate films on low-loss silicon nitride photonic integrated circuits. With this hybrid platform, we implement modulators that combine the ultralow optical loss ( 14.2 dB/m), mature processing and wide transparency of silicon nitride waveguides with the ultrafast electro-optic response of thin-film lithium tantalate. ... mehr


Originalveröffentlichung
DOI: 10.48550/arXiv.2508.06265
Zugehörige Institution(en) am KIT Institut für Photonik und Quantenelektronik (IPQ)
Publikationstyp Forschungsbericht/Preprint
Publikationsjahr 2026
Sprache Englisch
Identifikator KITopen-ID: 1000193455
Vorab online veröffentlicht am 08.08.2025
Nachgewiesen in arXiv
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