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Phase Noise Upconversion of non-1/ f Device Noise in Gate-All-Around Technology Nodes

Schramm, Lukas ORCID iD icon 1; Baumgartner, Peter; Aghassi-Hagmann, Jasmin ORCID iD icon 1
1 Institut für Nanotechnologie (INT), Karlsruher Institut für Technologie (KIT)

Abstract:

Phase noise is a key metric for evaluating oscillator stability in RF circuits, typically exhibiting a close-in spectral slope of 1/f3 due to the upconversion of underlying 1/f device noise. However, in advanced technology nodes, such as FinFETs, deviations from this expected behavior are increasingly observed, often driven by effects like random telegraph noise. In this work, we analyze how a novel form of non-1/f noise present in Gate-All-Around transistors affects oscillator phase noise, with a focus on its statistical behavior as a function of device size based on measurements across multiple devices and bias conditions. Our findings highlight the limitations of traditional noise assumptions and demonstrate the need for design strategies that account for the specific characteristics of non-1/f noise sources. We also show that accurate phase noise predictions require refined noise models that capture both bias and area dependence, as well as statistical variability across devices.


Zugehörige Institution(en) am KIT Institut für Nanotechnologie (INT)
Publikationstyp Zeitschriftenaufsatz
Publikationsjahr 2026
Sprache Englisch
Identifikator ISSN: 0741-3106, 1558-0563
KITopen-ID: 1000194663
Erschienen in IEEE Electron Device Letters
Verlag Institute of Electrical and Electronics Engineers (IEEE)
Seiten 1
Vorab online veröffentlicht am 08.06.2026
Externe Relationen Siehe auch
Schlagwörter flicker noise, non-1/f noise, GAA-transistor, FinFET
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