Fabrication-Compatible Photonic Structures for Ultra-Wide Visible Light Beam Shaping via Meta-Gratings

Precise and compact outcoupling of light from photonic integrated circuits (PICs) is a key requirement for the development of advanced on-chip optical sensing systems. While photonic receivers and detectors have miniaturized significantly, realizing large and uniform outcoupled beams, especially in the visible spectrum, remains challenging due to fabrication constraints limiting fine feature resolution. In this work, we present a design methodology for producing large-area grating structures that overcome these resolution limits by utilizing submicron-scale meta-gratings (MGs). Our approach replaces ultra-narrow binary grating features with fabrication-compatible geometries while preserving optical functionality. The result demonstrate a viable route for achieving visible-light beam shaping in integrated photonic systems while maintaining compatibility with existing fabrication technologies.