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LIF-Dip Measurement of Asymmetric Sheaths on a Planar Probe in a Pulsed Glow Discharge Electron Source

Orellana, Luis 1; An, Wladimir 1; Belozerov, Oleg 1; Müller, Georg 1; Weisenburger, Alfons 1
1 Institut für Hochleistungsimpuls- und Mikrowellentechnik (IHM), Karlsruher Institut für Technologie (KIT)

Abstract:

We present results from modified LIF-Dip measurements of electric field distributions in the sheaths formed on both sides of a planar probe inserted into a glow discharge. The plasma is generated inside a hollow anode, and an electron beam is extracted at one end of the discharge tube through a grid. The probe is oriented perpendicular to the tube axis and positioned at the discharge center inside the hollow anode. With the probe biased negatively, we measure the ion sheath electric field profiles above and below the probe in a single acquisition using the modified LIF-Dip method [1]. Complementary probe I-V characteristics were recorded to identify the plasma potential and to confirm operation in the ion-saturation regime during the LIF-Dip measurements.


Originalveröffentlichung
DOI: 10.1109/ICOPS53334.2026.11660218
Zugehörige Institution(en) am KIT Institut für Hochleistungsimpuls- und Mikrowellentechnik (IHM)
Publikationstyp Proceedingsbeitrag
Publikationsmonat/-jahr 06.2026
Sprache Englisch
Identifikator ISBN: 979-8-3315-8136-7
KITopen-ID: 1000197110
Erschienen in 2026 IEEE International Conference on Plasma Science (ICOPS)
Veranstaltung IEEE International Conference on Plasma Science (ICOPS 2026), Lake Tahoe, NV, USA, 22.06.2026 – 26.06.2026
Verlag Institute of Electrical and Electronics Engineers (IEEE)
Seiten 189
Nachgewiesen in Scopus
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