KIT | KIT-Bibliothek | Impressum | Datenschutz

Effect of substrate temperature on the microstructure of thin niobium films

Sürgers, Christoph ORCID iD icon 1; Strunk, Christoph 1; Löhneysen, Hilbert von 1
1 Physikalisches Institut (PHI), Karlsruher Institut für Technologie (KIT)


Niobium films with constant thickness have been deposited on sapphire (1120) by electron-beam evaporation at different substrate temperatures (150 °C ⩽TS ⩽ 750 °C). The samples were characterized by X-ray diffraction and resistivity measurements. X-ray reflectivity shows that all films are covered with an oxide layer of about 20 Å in ambient atmosphere. The (110) texture at high \{TS\} decreases towards lower TS, accompanied by an increasing surface roughness. Below \{TS\} = 350 °C the grain size in the growth direction becomes smaller than the film thickness and a relaxation of intrinsic stress is observed. A transition from a columnar growth structure to a fine grained microstructure is inferred. The change of the microstructure with \{TS\} is probably due to the temperature dependent grain boundary mobility during the deposition process.

DOI: 10.1016/0040-6090(94)90107-4
Zitationen: 20
Web of Science
Zitationen: 21
Zitationen: 16
Zugehörige Institution(en) am KIT Physikalisches Institut (PHI)
Publikationstyp Zeitschriftenaufsatz
Publikationsjahr 1994
Sprache Englisch
Identifikator ISSN: 0040-6090
KITopen-ID: 259994
Erschienen in Thin solid films
Verlag Elsevier
Band 239
Heft 1
Seiten 51-56
Nachgewiesen in Web of Science
KIT – Die Forschungsuniversität in der Helmholtz-Gemeinschaft
KITopen Landing Page