PT Journal
AU Dottermusch, S
   Busko, D
   Langenhorst, M
   Paetzold, UW
   Richards, BS
TI Exposure-dependent refractive index of Nanoscribe IP-Dip photoresist layers
SO Optics letters
PY 2019
BP 29
VL 44
IS 1
DI 10.1364/OL.44.000029
LA english
ER