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On tailored three-dimensional optical materials by atomic layer deposition

Frölich, Andreas Markus

Abstract:
Atomic Layer Deposition in combination with selective etch processes is exploited as a tool to impart tailored optical functionality to a three-dimensional polymeric nano-template made by Direct-Laser-Writing lithography. This way, tailor-doped semiconductor films and the first photonic crystal exhibiting a complete photonic bandgap in the visible are fabricated and characterized. The photonic crystal is shown to drastically modify the spontaneous emission of embedded emitters.

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Volltext §
DOI: 10.5445/IR/1000035498
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Zugehörige Institution(en) am KIT Institut für Angewandte Physik (APH)
Institut für Nanotechnologie (INT)
Publikationstyp Hochschulschrift
Jahr 2013
Sprache Englisch
Identifikator urn:nbn:de:swb:90-354988
KITopen-ID: 1000035498
HGF-Programm 43.14.01 (POF II, LK 01)
Verlag KIT, Karlsruhe
Abschlussart Dissertation
Fakultät Fakultät für Physik (PHYSIK)
Institut Institut für Angewandte Physik (APH)
Prüfungsdaten 24.05.2013
Referent/Betreuer Prof. M. Wegener
Schlagworte Photonic Crystals, Atomic Layer Deposition, three-dimensional Lithography, Optics, Nanotechnology
KIT – Die Forschungsuniversität in der Helmholtz-Gemeinschaft
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