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On tailored three-dimensional optical materials by atomic layer deposition

Frölich, Andreas Markus

Abstract:
Atomic Layer Deposition in combination with selective etch processes is exploited as a tool to impart tailored optical functionality to a three-dimensional polymeric nano-template made by Direct-Laser-Writing lithography. This way, tailor-doped semiconductor films and the first photonic crystal exhibiting a complete photonic bandgap in the visible are fabricated and characterized. The photonic crystal is shown to drastically modify the spontaneous emission of embedded emitters.

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Volltext §
DOI: 10.5445/IR/1000035498
Cover der Publikation
Zugehörige Institution(en) am KIT Institut für Angewandte Physik (APH)
Institut für Nanotechnologie (INT)
Publikationstyp Hochschulschrift
Publikationsjahr 2013
Sprache Englisch
Identifikator urn:nbn:de:swb:90-354988
KITopen-ID: 1000035498
HGF-Programm 43.14.01 (POF II, LK 01) Photonics crystals and metamaterials
Verlag Karlsruher Institut für Technologie (KIT)
Art der Arbeit Dissertation
Fakultät Fakultät für Physik (PHYSIK)
Institut Institut für Angewandte Physik (APH)
Prüfungsdaten 24.05.2013
Referent/Betreuer Prof. M. Wegener
Schlagwörter Photonic Crystals, Atomic Layer Deposition, three-dimensional Lithography, Optics, Nanotechnology
KIT – Die Forschungsuniversität in der Helmholtz-Gemeinschaft
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