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Enhancement of second-harmonic generation in nonlinear nanolaminate metamaterials by nanophotonic resonances

Hsiao, H. H. 1; Abass, A. 2; Fischer, J. 3; Alaee, R. 1; Wickberg, A. 3; Wegener, M. 2,3; Rockstuhl, C. 1,2
1 Institut für Theoretische Festkörperphysik (TFP), Karlsruher Institut für Technologie (KIT)
2 Institut für Nanotechnologie (INT), Karlsruher Institut für Technologie (KIT)
3 Institut für Angewandte Physik (APH), Karlsruher Institut für Technologie (KIT)

Abstract (englisch):

Nanolaminate metamaterials recently attracted a lot of attention as a novel second-order nonlinear material that can be used in integrated photonic circuits. Here, we explore theoretically and numerically the opportunity to enhance the nonlinear response from such nanolaminates by exploiting Fano resonances supported in grating-coupled waveguides. The enhancement factor of the radiated second harmonic signal compared to a flat nanolaminate can reach values as large as 35 for gold gratings and even 7000 for MgF2 gratings. For the MgF2 grating, extremely high-Q Fano resonances are excited in such all-dielectric system that result in strong local fields in the nonlinear waveguide layer to boost the nonlinear conversion. A significant portion of the nonlinear signal is also strongly coupled to a dark waveguide mode, which remains guided in the nanolaminate. The strong excitation of a dark mode at the second harmonic frequency provides a viable method for utilizing second-order nonlinearities for light generation and manipulation in integrated photonic circuits.

Volltext §
DOI: 10.5445/IR/1000054674
DOI: 10.1364/OE.24.009651
Zitationen: 12
Web of Science
Zitationen: 12
Zitationen: 11
Cover der Publikation
Zugehörige Institution(en) am KIT Institut für Angewandte Physik (APH)
Institut für Nanotechnologie (INT)
Institut für Theoretische Festkörperphysik (TFP)
Universität Karlsruhe (TH) – Interfakultative Einrichtungen (Interfakultative Einrichtungen)
Karlsruhe School of Optics & Photonics (KSOP)
Publikationstyp Zeitschriftenaufsatz
Publikationsjahr 2016
Sprache Englisch
Identifikator ISSN: 1094-4087
KITopen-ID: 1000054674
HGF-Programm 43.23.01 (POF III, LK 01) Advanced Optical Lithography+Microscopy
Erschienen in Optics Express
Verlag Optica Publishing Group (OSA)
Band 24
Heft 9
Seiten 9651-9659
Bemerkung zur Veröffentlichung Gefördert durch den KIT-Publikationsfonds
Nachgewiesen in Scopus
Web of Science
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