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Silica in humid air environment: (II): Diffusion under moderate stresses

Fett, Theo; Wiederhorn, Sheldon M.

Abstract:
Water diffusion into silica glass results in a thin zone near the surface of the glass. In this zone molecular and hydroxyl water are present. The content of hydroxyl water increases its specific volume so that the silica expands and the volume near the surface is larger than it was before being penetrated by the water. Suppressed free expansion of the glass causes biaxial compressive swelling stresses.
The effect of such swelling stresses and also of moderate externally applied stresses on the diffusion behaviour will be studied in this report for the case of a gaseous water environment at temperatures <500°C.
In the Appendix also the effect of stress-enhanced equilibrium constant is addressed and the behavior at higher temperatures briefly considered.


Zugehörige Institution(en) am KIT Institut für Angewandte Materialien - Keramische Werkstoffe und Technologien (IAM-KWT)
Publikationstyp Forschungsbericht
Jahr 2017
Sprache Englisch
Identifikator DOI(KIT): 10.5445/IR/1000068620
ISSN: 2194-1629
URN: urn:nbn:de:swb:90-686205
KITopen ID: 1000068620
Verlag KIT, Karlsruhe
Umfang VI, 23 S.
Serie KIT Scientific Working Papers ; 60
Lizenz CC BY-SA 4.0: Creative Commons Namensnennung – Weitergabe unter gleichen Bedingungen 4.0 International
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