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3D whispering-gallery-mode microlasers by direct laser writing and subsequent soft nanoimprint lithography

Brenner, Philipp; Bar-On, Ofer; Siegle, Tobias; Leonhard, Tobias; Gvishi, Raz; Eschenbaum, Carsten; Kalt, Heinz; Scheuer, Jacob; Lemmer, Uli

Abstract (englisch):
We demonstrate the realization of 3D whispering-gallery-mode (WGM) microlasers by direct laser writing (DLW) and their replication by nanoimprint lithography using a soft mold technique (“soft NIL”). The combination of DLW as a method for rapid prototyping and soft NIL offers a fast track towards large scale fabrication of 3D passive and active optical components applicable to a wide variety of materials. A performance analysis shows that surface-scattering-limited 𝑄-factors of replicated resonators as high as 1×105 at 635 nm can be achieved with this process combination. Lasing in the replicated WGM resonators is demonstrated by the incorporation of laser dyes in the target material. Low lasing thresholds in the order of 15  kW/cm2 are obtained under ns-pulsed excitation.



Originalveröffentlichung
DOI: 10.1364/AO.56.003703
Zugehörige Institution(en) am KIT Institut für Angewandte Physik (APH)
Institut für Mikrostrukturtechnik (IMT)
Lichttechnisches Institut (LTI)
Publikationstyp Zeitschriftenaufsatz
Jahr 2017
Sprache Englisch
Identifikator ISSN: 0003-6935, 1539-4522, 1540-8981
KITopen-ID: 1000069272
HGF-Programm 43.22.03 (POF III, LK 01)
Erschienen in Applied optics
Band 56
Heft 13
Seiten 3703
Bemerkung zur Veröffentlichung https://www.osapublishing.org/ao/abstract.cfm?uri=ao-56-13-3703
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