KIT | KIT-Bibliothek | Impressum
Open Access Logo
DOI: 10.5445/IR/1000078268

Effect of negative T-stress on R-curves for Si3N4-ceramics

Zielonka, Paul; Hettich, Pascal; Fünfschilling, Stefan; Schell, Günter; Rizzi, Gabriele; Fett, Theo

The main advantages of DCDC-specimens, completely stable crack extension and very high path stability due to the strongly negative Tstress term call for an application in R-curve determination. In this report, it is studied whether the T-stress affects the R-curve of silicon nitride. For this purpose, we selected three Si3N4-ceramics, which showed very flat crack resistance curves in test with edge-notched 4-point bending specimens. These materials were tested with DCDC-specimens. In contrast to the bending tests, the crack resistance decreased clearly. This effect can be understood as a consequence of the T-stress term.

Zugehörige Institution(en) am KIT Institut für Angewandte Materialien - Keramische Werkstoffe und Technologien (IAM-KWT)
Publikationstyp Forschungsbericht
Jahr 2017
Sprache Englisch
Identifikator ISSN: 2194-1629
URN: urn:nbn:de:swb:90-782686
KITopen ID: 1000078268
Verlag KIT, Karlsruhe
Umfang VI, 12 S.
Serie KIT Scientific Working Papers ; 76
KIT – Die Forschungsuniversität in der Helmholtz-Gemeinschaft KITopen Landing Page