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DOI: 10.5445/IR/1000089939
Veröffentlicht am 21.01.2019

Damage and Young's modulus reduction in silica by hydroxyl generation

Fett, Theo; Schell, Günter

Abstract (englisch):
Water diffusion into silica glass results in a thin zone near the surface of the glass. In this zone the water reacts with the SiO2 structure and “damages” the originally intact SiO2 rings. The consequence is a reduced Young’s module. This effect can be described by use of continuum damage mechanics according to Kachanov [1] and Lemaitre [2]. In this paper the dependency between hydroxyl concentration and damage will be described for large water concentrations by using the pore models of Wang [3] and Phani and Niogy [4]. As an application, the hydroxyl concentration at crack tips is computed and crack-tip stress intensity factor is estimated.


Zugehörige Institution(en) am KIT Institut für Angewandte Materialien - Keramische Werkstoffe und Technologien (IAM-KWT)
Publikationstyp Forschungsbericht
Jahr 2019
Sprache Englisch
Identifikator ISSN: 2194-1629
URN: urn:nbn:de:swb:90-899398
KITopen-ID: 1000089939
Verlag KIT, Karlsruhe
Umfang VI, 14 S.
Serie KIT Scientific Working Papers ; 106
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