KIT | KIT-Bibliothek | Impressum | Datenschutz

Scanner‐Based Capillary Stamping

Hou, Peilong; Kumar, Ravi; Oberleiter, Bastian; Kohns, Richard; Enke, Dirk; Beginn, Uwe; Fuchs, Harald; Hirtz, Michael; Steinhart, Martin

Abstract:
Classical microcontact printing and polymer pen lithography (PPL) involve ink transfer to substrates using solid elastomeric stamps. Ink depletion thus limits the number of successive stamping steps without reinking. Porous stamps developed to overcome this limitation are used only for manual proof‐of‐principle experiments. Here, porous composite stamps for scanner‐based capillary stamping (SCS) that can be mounted on automated printing devices designed for PPL are developed. Porous SCS composite stamps consist of a rigid controlled porous silica glass (CPG) layer and a porous polymeric stamping layer. The latter can be topographically structured with contact elements by replication molding. The mechanical stabilization by the CPG layer ensures that the contact elements are coplanar. SCS allows automated, continuous, high‐throughput patterning enabled by ink supply through the porous SCS composite stamps. Even after more than 800 consecutive stamp–substrate contacts without reinking (the porous SCS composite stamps themselves are used as ink reservoirs), ink microdroplets are deposited without deterioration of the pattern quality. However, SCS also allows supply of additional ink during ongoing stamping operations through the pore systems of the porous SCS composite stamps. ... mehr

Open Access Logo


Verlagsausgabe §
DOI: 10.5445/IR/1000119146
Veröffentlicht am 08.07.2020
Originalveröffentlichung
DOI: 10.1002/adfm.202001531
Scopus
Zitationen: 3
Web of Science
Zitationen: 3
Cover der Publikation
Zugehörige Institution(en) am KIT Institut für Nanotechnologie (INT)
Karlsruhe Nano Micro Facility (KNMF)
Publikationstyp Zeitschriftenaufsatz
Publikationsdatum 18.06.2020
Sprache Englisch
Identifikator ISSN: 1616-301X, 1616-3028
KITopen-ID: 1000119146
HGF-Programm 43.22.03 (POF III, LK 01) Printed Materials and Systems
Weitere HGF-Programme 49.01.01 (POF III, LK 02) INT-KNMF Structuring Lab
Erschienen in Advanced functional materials
Verlag Wiley-VCH Verlag
Band 30
Heft 25
Seiten Art. Nr.: 2001531
Vorab online veröffentlicht am 26.04.2020
Nachgewiesen in Scopus
Web of Science
KIT – Die Forschungsuniversität in der Helmholtz-Gemeinschaft
KITopen Landing Page