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In-situ bandaged Josephson junctions for superconducting quantum processors

Bilmes, A.; Händel, A. K.; Volosheniuk, S.; Ustinov, A. V.; Lisenfeld, J.


Shadow evaporation is commonly used to micro-fabricate the key element of superconducting qubits—the Josephson junction. However, in conventional two-angle deposition circuit topology, unwanted stray Josephson junctions are created which contribute to dielectric loss. So far, this could be avoided by shorting the stray junctions with a so-called bandage layer deposited in an additional lithography step, which may further contaminate the chip surface. Here, we present an improved shadow evaporation technique allowing one to fabricate sub-micrometer-sized Josephson junctions together with bandage layers in a single lithography step. We also show that junction aging is significantly reduced when junction electrodes are passivated in an oxygen atmosphere directly after deposition.

Verlagsausgabe §
DOI: 10.5445/IR/1000140671
Veröffentlicht am 06.12.2021
DOI: 10.1088/1361-6668/ac2a6d
Zitationen: 8
Web of Science
Zitationen: 10
Zitationen: 12
Cover der Publikation
Zugehörige Institution(en) am KIT Physikalisches Institut (PHI)
Publikationstyp Zeitschriftenaufsatz
Publikationsdatum 29.10.2021
Sprache Englisch
Identifikator ISSN: 0953-2048, 1361-6668
KITopen-ID: 1000140671
Erschienen in Superconductor Science and Technology
Verlag Institute of Physics Publishing Ltd (IOP Publishing Ltd)
Band 34
Heft 12
Seiten Art.Nr. 125011
Nachgewiesen in Dimensions
Web of Science
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