KIT | KIT-Bibliothek | Impressum | Datenschutz

A reason for the occurrence of mass-transfer coefficients at silica surfaces

Schell, Günter ORCID iD icon 1; Bucharsky, Claudia 1; Wagner, Susanne 1; Fett, Theo 1
1 Institut für Angewandte Materialien – Keramische Werkstoffe und Technologien (IAM-KWT1), Karlsruher Institut für Technologie (KIT)

Abstract:

At silica surface exposed to a water vapour environment, there is a monotonously increasing water concentration observed that calls for a limited mass transfer from the humid environment to the surface. Such behaviour is characterized by a “mass transfer coefficient". We have demonstrated in several studies that silica glass surfaces may present a barrier to the diffusion of water into silica. We could interpret the experimental diffusion results of Oehler and Tomozawa (2004) and those of Helmich and Rauch (1993). Such a surface layer formed by diffusion and water reaction with the surface material, was studied by Mahadevan and Garofalini (2008). Compressive hydrostatic stresses in the surface layers reach a maximum value of σ$_{sw,h}$ = − 2.8GPa. Due to such high compressive stresses, the water diffusivity must be strongly reduced within this thin layer and, consequently, also the mass transfer coefficient. These effects will be considered in detail in this report.


Volltext §
DOI: 10.5445/IR/1000165730
Veröffentlicht am 19.12.2023
Cover der Publikation
Zugehörige Institution(en) am KIT Institut für Angewandte Materialien – Keramische Werkstoffe und Technologien (IAM-KWT1)
Publikationstyp Forschungsbericht/Preprint
Publikationsmonat/-jahr 12.2023
Sprache Englisch
Identifikator ISSN: 2194-1629
KITopen-ID: 1000165730
Verlag Karlsruher Institut für Technologie (KIT)
Umfang VI, 11 S.
Serie KIT Scientific Working Papers ; 238
KIT – Die Forschungsuniversität in der Helmholtz-Gemeinschaft
KITopen Landing Page