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Impact of Charge Carrier Trapping on GaN-HEMT Characteristics at Cryogenic Temperatures

Fein, Martin ORCID iD icon 1; Swoboda, Philipp ORCID iD icon 1; Frank, Simon 1; Schwendemann, Ruediger ORCID iD icon 1; Hiller, Marc 1
1 Elektrotechnisches Institut (ETI), Karlsruher Institut für Technologie (KIT)

Abstract:

This paper presents an investigation of the static and dynamic on-resistance RDS,on using a fully automated, modular measurement setup, which enables the characterization of commercially available Gallium-Nitridehigh- electron mobility transistors at cryogenic temperatures (77K). The circuit is based on an extended modified double pulse test, enabling the characterization in an application-oriented setup over a wide temperature range while minimizing self-heating effects. The focus is on the investigation of charge-carrier trapping in terms of dynamic on-resistance dRDS,on at cryogenic temperature. The presented setup enables systematic investigation of these effects, with distinguishable trapping sources. Measurements of the static on-resistance RDS,on show a significant decrease due to the increased electron mobility at cryogenic temperatures. Results of dynamic on-resistance dRDS,on analysis show a much reduced degradation of dRDS,on compared to measurements at room temperature under soft-switching and hardswitching, as well as a negligible effect after the application of a drain-voltage-bias.


Preprint §
DOI: 10.5445/IR/1000199117
Veröffentlicht am 13.11.2026
Originalveröffentlichung
DOI: 10.30420/566716362
Cover der Publikation
Zugehörige Institution(en) am KIT Elektrotechnisches Institut (ETI)
Publikationstyp Proceedingsbeitrag
Publikationsjahr 2026
Sprache Englisch
Identifikator KITopen-ID: 1000199117
Erschienen in PCIM Conference 2026; PCIM Conference 2026
Veranstaltung PCIM Conference (2026), Nürnberg, Deutschland, 09.06.2026 – 11.06.2026
Seiten 2735-2743
Serie 1
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