Standard model and new physics for ϵ′ kϵk∞ Kitahara, T. 2018. 2nd International Workshop on Flavour Changing and Conserving Processes, FCCP 2017; Villa Orlandi`Anacapri, Capri Island; Italy; 7 September 2017 through 9 September 2017. ed.: M. Passera, Art.Nr. 01007, EDP Sciences. doi:10.1051/epjconf/201817901007
Reliable memory PUF design for low-power applications Golanbari, M. S.; Kiamehr, S.; Bishnoi, R.; Tahoori, M. B. 2018. 19th International Symposium on Quality Electronic Design, ISQED 2018; Santa Clara Convention CenterSanta Clara; United States; 13 March 2018 through 14 March 2018, 207–213, IEEE Computer Society. doi:10.1109/ISQED.2018.8357289
Measurement of the radiative capture cross section of the s-process branching points 204Tl and 171Tm at the n-TOF facility (CERN) Casanovas, A.; Domingo-Pardo, C.; Guerrero, C.; Lerendegui-Marco, J.; Calviño, F.; Tarifeño-Saldivia, A.; Dressler, R.; Heinitz, S.; Kivel, N.; Quesada, J. M.; Schumann, D.; Aberle, O.; Alcayne, V.; Andrzejewski, J.; Audouin, L.; Bécares, V.; Bacak, M.; Barbagallo, M.; Bečvář, F.; Bellia, G.; et al. 2018. 16th International Symposium on Capture Gamma-Ray Spectroscopy and Related Topics, CGS 2017; Shanghai Jiao Tong UniversityShanghai; China; 18 September 2017 through 22 September 2017. Ed.: Y. Sun, Art.Nr. 03004, EDP Sciences. doi:10.1051/epjconf/201817803004
Enabling proximity mask-aligner lithography with a 193nm CW light source Kirner, R.; Vetter, A.; Opalevs, D.; Scholz, M.; Leisching, P.; Scharf, T.; Noell, W.; Rockstuhl, C.; Voelkel, R. 2018. Optical Microlithography XXXI 2018; San Jose; United States; 27 February 2018 through 1 March 2018. Ed.: J. Kye, Art.Nr. 105871F, Society of Photo-optical Instrumentation Engineers (SPIE). doi:10.1117/12.2297171
Mask-aligner Talbot lithography using a 193nm CW light source Vetter, A.; Kirner, R.; Opalevs, D.; Scholz, M.; Leisching, P.; Scharf, T.; Noell, W.; Rockstuhl, C.; Voelkel, R. 2018. Optical Microlithography XXXI 2018; San Jose; United States; 27 February 2018 through 1 March 2018. Ed.: J.Kye, Art.Nr. 105870W, Society of Photo-optical Instrumentation Engineers (SPIE). doi:10.1117/12.2296503
Towards large-scale image retrieval with a disk-only index Manger, D.; Willersinn, D.; Beyerer, J. 2018. 13th International Joint Conference on Computer Vision, Imaging and Computer Graphics Theory and Applications, VISIGRAPP 2018; Funchal, Madeira; Portugal; 27 January 2018 through 29 January 2018. Ed.: J. Braz, 367–372, SciTePress
Open set logo detection and retrieval Tüzko, A.; Herrmann, C.; Manger, D.; Beyerer, J. 2018. 13th International Joint Conference on Computer Vision, Imaging and Computer Graphics Theory and Applications, VISIGRAPP 2018; Funchal, Madeira; Portugal; 27 January 2018 through 29 January 2018. Ed.: J. Braz, 284–292, SciTePress
Research highlights obtained with the mobile observation platform KITcube Adler, B.; Kalthoff, N.; Wieser, A.; Kohler, M.; Handwerker, J.; Metzger, J.; Corsmeier, U.; Kiseleva, O.; Kottmeier, C. 2018. 19th International Symposium for the Advancement of Boundary-Layer Remote Sensing (ISARS 2018), Cologne, Germany, May 22–25, 2018
Projects Stapf, D. 2018. IEA Bioenergy Task 36 Meeting (2018), Copenhagen, Denmark, May 17, 2018
Pretreatment of Waste for Biomass-Co-Gasification Ciceri, G.; Wexler, M.; Stapf, D. 2018. Workshop „Production and utilisation options for Solid Recovered Fuels“ (2018), Copenhagen, Denmark, May 17, 2018